SURFACE INTERFACE ONTARIO

"CREATING PARTNERSHIPS FOR INNOVATIVE RESEARCH"

Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS)

Principles

  • Pulsed primary ion beam
  • Sputters ~ 0.1% of the top monolayer (static mode)
  • Secondary ions (& neutrals) are emitted from surface
  • Secondary ions mass analysed by measuring their time-of-flight from sample to detector
  • Mass spectrum and secondary ion images used to obtain composition, distribution and molecular information of surface constituents

Information:

  • Composition & distribution of species at the surface
  • Elemental, isotopic & chemical analysis (atomic and molecular species) - complete mass spectrum
  • High mass range (up to 10k Daltons)
  • High mass resolution (> 9,000)
  • Excellent sensitivity. Submonolayer analysis - ppm levels
  • Effective charge compensation for insulators, allowed by the pulsed mode of the source
  • Small spot (submicron) mapping - down to 100 nm
  • Dual-beam and ultra-shallow depth profiling - information on and into the surface
Detailed information on the technique can be obtained in:

Sodhi, Rana N.S., "Time-of-flight secondary ion mass spectrometry (ToF-SIMS): - versatility in chemical and imaging surface analysis", Analyst 129:483-487(2004).

For more information on the ION-TOF system, see www.iontof.com